You are offered various specialized software extension modules to increase the potential of the versatile eLitho and eDraw software:
- image analysis
measuring and analyzing the data of captured images
|
- multi-pass scanning
milling and deposition of structures by multiple steps
|
- enhanced stage handling
capacious controlling of the microscope stage
|
- stitching
separating layouts for stage stitching
|
- advanced capture
rapid capture functionality for microscope adjustment and process documentation
|
- live lithography
in situ designing and writing of structures by means of acquired snapshots
|
- scripting
automation of complex lithography tasks by editing control sequences
|
- proximity correction (EBL)
avoiding the negative influence of the proximity effect on dose-critical structures
|
- drift correction
compensation for drift during long term processes
|
- etch profile (FIB)
recording sample current and detector-signal for determination of the etch-progress
|
- global microscope parameter set
changing complete sets of microscope parameters during processing
|
- 3D-surface
converting and processing height encoded data for 3 dim structures
|
Contact Us