eLitho Extension Line

The lithography systems of the eLitho extension line are comprehensive, high performance add-on modules for commercial microscopes (SEM, FIB, STEM, TEM, multi-beam). They are easy to use and provide a broad variety of expedient definitions with respect to electronics and software complexity. All realizations are based on the layout-editor eDraw for the structure design and the eLitho control software for supervising the lithography process. Thus virtually every scanning microscope can be utilized to achieve a perspicuous, multi-functional nanolithography unit.

  • eDraw CAD layout editor
  • eLitho Exposure-control and documentation software
  • Software modules increase the potential of the software due to sophisticated tasks

eLitho EK 5000nanonic offers a wide variety of pertinent high quality hardware models for electron beam and FIB lithography:

  • EK 3000 universal 19” comprehensive lithography unit
  • EK 3100 high performance providing a 50% higher maximum writing speed
  • EK 3000²/EK 3100² special systems for controlling two beam system (SEM/FIB)
  • EK 5000/EK 5000² high end lithography system for ambitious applications

 All hardware models utilize progressive DSP-based electronics, which are specially designed to fit in the potentials of the used machine.

 

In order to satisfy possible additional requirements as for a capable running lithography system we offer several useful hardware accessories for the eLitho system.

We are looking forward to an on site demonstration of our systems. Please do not hesitate to contact us.

 

Hardware

The progressive DSP-based hardware is specially designed to fit in the potentials of the used machine. We provide three systems. The EK 3000 system is an universal economic lithography electronics for nearly all SEM or FIB systems. For higher deflection speed the EK 3100 system is available. The high performance EK 5000 hardware has been developed to use in all respects the full capacity of state-of-the-art machines.

Here we present some features of our hardware components:

  • high resolution (16 bit DACs) vector scan method (e.g. arbitrary scan direction, line or meander scan, circle and arc scan mode)
  • all-digital pattern position ascertainment
  • fast 12 bit ADC for image capture (optional 2 channels)
  • beam blanking control
  • pico-ampere-meter (optional)
  • pre-installed PC with TFT monitor
  EK 2000 EK 3000 EK 3100 EK 5000  
  • maximum writing speed (continuous pixel to pixel)
 2.7 MHz 5.0 MHz 7.5 MHz 12 MHz  
  • time resolution (full bandwidth)
 16 ns 13 ns 13 ns 3 ns  
  • maximum image size (pixel)
 2048 6144 12288 32768  
  • maximum writing speed (continuous pixel to pixel)
  EK 2000 EK 3000 EK 3100 EK 5000
  2.7 MHz 5.0 MHz 7.5 MHz 12 MHz
  • time resolution (full bandwidth)
  EK 2000 EK 3000 EK 3100 EK 5000
  16 ns 13 ns 13 ns 3 ns
  • maximum image size (pixel)
  EK 2000 EK 3000 EK 3100 EK 5000
  2048 6144 12288 32768

 

Connection diagram
Diagram showing the connection between eLitho system and a SEM or FIB machine.

 

Service

Our default service includes:

  • substantial guidance as for acquisition of a lithography-establishment
  • adaptation to SEM, STEM or FIB
  • on site installation and user training

 

Due to a steady improvement of our products specifications are subject to change without notice.