This elaborate CAD-tool provides you with the effortless creation of your lithographic structures even if they are quite complex. The editing features will assist you in designing multi-layer devices and in attributing lithography-specific parameters to the patterns. Some highlights of eDraw are:

• Supported platforms: Windows 7, 8, 8.1 and 10

• Clearly arranged graphical user interface

• Broad variety of provided elements: single points, single pixel lines, areas and outlines of rectangles, polygons, circles, circular arcs and ellipses

• Bitmap import

• Extremely flexible and clear parameter coordination

• Comprehensive manipulation tools for editing the structures and defining exposure parameters of the single elements as well as their writing sequence

• Full depth undo/redo functionality

• Hierarchical structure management

• Support of multi-layer structures and instances in order to create structural arrays according to the parent-child principle

• Direct support of lithography specific parameters (e.g. scanning area, element order, dose series, element dose factors and scan parameters)

• GDSII, CIF and DXF layout data import