This elaborate CAD-tool provides you with the effortless creation of your lithographic structures even if they are quite complex. The editing features will assist you in designing multi-layer devices and in attributing lithography-specific parameters to the patterns. Some highlights of eDraw are:

 

  • eDraw - Layout EditorSupported platforms: Windows 7, 8, 8.1 and 10

  • Clearly arranged graphical user interface

  • Broad variety of provided elements: single points, single pixel lines, areas and outlines of rectangles, polygons, circles, circular arcs and ellipses

  • Bitmap import

  • Extremely flexible and clear parameter coordination

  • Comprehensive manipulation tools for editing the structures and defining exposure parameters of the single elements as well as their writing sequence

  • Full depth undo/redo functionality

  • Hierarchical structure management

  • Support of multi-layer structures and instances in order to create structural arrays according to the parent-child principle

  • Direct support of lithography specific parameters (e.g. scanning area, element order, dose series, element dose factors and scan parameters)

  • GDSII, CIF and DXF layout data import